Purpose |
Process to be applied |
Main application scope |
---|---|---|
In a pipe, after a chamber, it: - Removes remaining micro moisture and suppress powder generation - Activates catalysts to facilitate the gas exhaustion of a semiconductor manufacturing equipment, etc. |
Activates catalysts to facilitate the gas exhaustion of a semiconductor manufacturing equipment, etc. CVD process of an LCD Line |
- Pump to Scrubber - Chamber to Pump line - Vacuum line - Gas Delivery line - Exhaust line - Bake-out Chamber |
Purpose |
Process to be applied |
Main application scope |
---|---|---|
Maintains the connection to facilitate the gas exhaustion of a semiconductor manufacturing equipment, etc. | Vacuum process of semiconductor / display |
- Pump to Scrubber - Chamber to Pump line - Vacuum line - Fore line - Gas Delivery line - Exhaust line - Bake-out Chamber |
Purpose |
Process to be applied |
Main application scope |
---|---|---|
Prevents leak and erosion to facilitate gas exhaustion of manufacturing equipment of semiconductor, etc. | Vacuum process of semiconductor/display |
- SUS Chamber - SUS Bath - Manufactures and handles special non-ferrous metal - Manufactures JIG and Parts - P.P Fitting Machine - PTFE Fitting Machine |